GIK CENTELLA GIOSSY MASK Soothing Repair for Sensitive and Acne-prone Skin,21pcs 1 phần

Reveal the advantages of the GIK Centella Glossy Mask, a swift remedy for skin recovery, diminishing redness, swelling, and acne. Infused with centella asiatica, ceramide, chamomile, and bifid yeast, this mask delivers brightening and firming effects to your complexion. Experience the revitalizing power of this potent combination of nourishing elements, leaving your skin refreshed and revitalized in mere minutes. Elevate your skincare routine with the GIK Centella Glossy Mask and discover the secret to radiant, youthful-looking skin. 21PCS.

How to use:

After cleansing and toning, place the mask on for five minutes before removal. This mask is best used every morning and night.

1. Skin Recovery in Minutes: GIK Centella Glossy Mask swiftly diminishes redness, swelling, and acne, promoting rapid skin recovery.
2. Brightening and Firming Effects: Infused with centella asiatica, ceramide, chamomile, and bifid yeast, this mask delivers revitalizing brightness and firmness to your complexion.
3. Nourishing and Revitalizing: Experience the potent combination of nourishing elements, leaving your skin refreshed and revitalized in mere minutes with GIK Centella Glossy Mask

Ingredients:

Water, Glycerin, Methylpropanediol, Centella Asiatica Extract, Bifida Ferment Filtrate, Ceramide NP, Beta-Glucan, Camellia Sinensis Leaf Extract, Sodium Hyaluronate, Chamomilla Recutita (Matricaria) Flower Extract, Polysorbate 20, Carbomer, Arginine, Ethylhexylglycerin, Hydroxyethylcellulose, Disodium EDTA, Sodium Polyacrylate, Allantoin, Trehalose, Butylene Glycol, 1,2-Hexanediol, Dipropylene Glycol, Tocopheryl Acetate, Hydrogenated Lecithin, Phenoxyethanol, Fragrance, Butylphenyl Methylpropional